Hardware·Americas
Onto Innovation Unveils Metrology System for BAW Devices
Key Points
- 1New IVS 220 system measures edge air layer structures efficiently.
- 2Improves accuracy in critical dimension measurements for BAW technology.
- 3Enhances national tech capabilities in acoustic wave resonator manufacturing.
Onto Innovation has launched the IVS 220 optical overlay and CD metrology system, designed specifically to measure the edge air layer structure in bulk acoustic wave (BAW) resonators. These devices play a crucial role in modern communication systems, functioning as filters and sensors by confining acoustic waves to achieve efficient resonance. The IVS 220 system boasts high throughput of 130 wafers per hour and precision in measuring critical dimensions of edge air layers—a critical factor in minimizing acoustic energy leakage.
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